Yang LUO is currently a second-year Ph.D. student in Microelectronics at the Hong Kong University of Science and Technology (Guangzhou), where he is supervised by Prof. Yuzhe Ma and Prof. Yeyu Tong. His research focuses on Machine Learning and Electronic Design Automation (EDA), with particular interests in AI4EDA (leveraging AI algorithms to automate chip design processes), optimization under engineering constraints, generative models (exploring their applications in traditional EDA workflows), and Large Language Models (developing EDA software oriented towards LLMs).
He received his B.E. degree in Intelligence Science and Technology from the University of Science and Technology Beijing, China. He also holds an M.S. degree from the School of Computer Science and Technology, University of Chinese Academy of Sciences, Beijing, China.
If you’re interested in my research, feel free to reach out! I look forward to discussing and collaborating with you!
🔥 News
- 2024.06: 🎉🎉 Excited to announce that my first paper as a Ph.D. student has been accepted to ICCAD 2024! Many thanks to my advisor and colleagues for their support!
- 2023.09: 🎉🎉 I’m excited to have joined HKUST (GZ)! Looking forward to my research journey ahead and outcomes!
📝 Publications
Enabling Robust Inverse Lithography with Rigorous Multi-Objective Optimization
In IEEE/ACM International Conference on Computer-Aided Design (ICCAD ’24)
Yang LUO, Xiaoxiao LIANG, Yuzhe MA
- Contribution: Theoretical analysis and algorithm design, experiment implementation, and paper writing
International Journal of Control, Automation and Systems (IJCAS ’20)
YongZhen GUO, Yang LUO, WangWei PING, et al.
- Contribution: Theoretical analysis and algorithm design, experiment implementation, and paper writing
🛠 Work-in-progress
- Inverse Lithography Technology: 🔨 Developing a mask optimization algorithm for lithography to improve the robustness of inverse lithography.
- Hardware Language Generation: 🔨 Investigating the potential of large language models for generating hardware description languages.
- LLM-oriented EDA Tools: 🔨 Designing a new generation of EDA tools that leverage the capabilities of large language models.
🎖 Honors and Awards
- 2020 Tianchi competition of MEDIA-AI Alibaba Algorithm Challenge - HD Video Segmentation (6/733)
- 2019 Excellent graduates of Beijing University of Science and Technology
- 2018 National Third Prize of Siemens Intelligent Manufacturing Competition
- 2018 National Third Prize in the 8th “Huawei Cup” National Undergraduate Intelligent Design Competition
- 2016~2018 People’s Scholarship, Outstanding student
📖 Educations
M.S. degree from School of Computer Science and Technology, University of Chinese Academy of Sciences, Beijing, China
2019.09 - 2023.01
B.E. degree from Intelligence Science and Technology, the University of Science and Technology Beijing, China
2015.09 - 2019.06
💻 Internships
- 2021.08 - 2022.06, SmartMore, Shenzhen. Working with Xufeng Yao and Prof.Bei Yu on OCR and model compressing.
- 2021.04 - 2021.07, Samsung Advanced Institute of Technology & Peking University ZERO Lab, Beijing. Working with Bin Dai on group-equivalent network for object detection